SINGULUS PECVD ICP - Plasma Enhanced Chemical Vapor Deposition | Coating Equipment, Other
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    Item Details

    Item Id 366331
    Item #: 366331
    Item: SINGULUS PECVD ICP - Plasma Enhanced Chemical Vapor Deposition
    Model #: Singular ICP PECVD
    Serial #: N/A
    Year Built: N/A
    Location: California
    Price: $775,000.00

    Description

    Singulus ICP PECVD (Plasma Enhanced Chemical Vapor Deposition) system. Excellent condition, not many wafers ran. Several STP turbo pumps. Complete with large Edwards roughing pump.

    Sequence is:
    -Loadlock
    -PS1 = IR heating station
    -PS2 = PECVD Coating, top down for intrinsic a-Si (clean chamber)
    -PS3 = IR heating station
    -PS4 = PECVD Coating, Top down for dopted a-Si, SiOx, SiNx (dirty chamber)
    -Empty
    -Loadlock

    We have the full specification sheet available upon request. This system was 1,700,000.00 new.

    Inquire with questions.

    Additional Prep Fees May Apply

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