VICI Valco Helium Purifier and Nitrogen Purifier model: HP2
**Unit in box with accessories Included. This is in great conditions. Has slight cosmetic blemishes from normal use. See photos for further details.
Carrier gas purity is essential in any application requiring extreme sensitivity. Impurities limit detector sensitivity and can even destroy capillary columns. The Valco HP2 (helium purifier) provides point-of-use purification of helium or other noble gases, such as Ar, Ne, Kr, and Xe, to sub-ppm levels of reactive gaseous impurities. The NP2 (nitrogen purifier) is similar, purifying nitrogen to subppm levels of gaseous impurities. The purification substrate in Valco gas purifiers is a nonevaporable gettering alloy. This stable alloy is contained in a welded assembly, so the purifiers can be used safely in industrial applications with minimal precautions. Description and Operating Principle & Helium and Nitrogen Purifiers Analytical Components Systems Specifications
The getter is activated by heating, which eliminates the oxide film on the particle surface and allows helium to diffuse into the bulk of the getter particles. This leaves the surface free from the passivating oxide layers and available for sorption. Activation must be performed under a vacuum or inert gas (He, Ar, Kr, or Xe) atmosphere. The helium and nitrogen purifiers feature a self regulating design which eliminates the possibility of thermal runaway and maintains the getter material at the optimum temperature
Point-of-use purification to low ppm levels
CE-compliant
Simple maintenance
Specifications
Helium Purifier (HP2) Nitrogen Purifier (NP2)
Gases purified He, Ne, Ar, Kr, Xe, RnHe, Ne, Ar, Kr, Xe, Rn, N2
Max. operating pressure 1000 psig1000 psig
Max. operating temperature 400C400C
Max. flow rate1 liter/min 1 liter/min
Impurities not removed He, Ne, Ar, Kr, Xe, and RnHe, Ne, Ar, Kr, Xe, Rn, CH4, and N2
Impurities removed Outlet impurities less than 10 ppb H2O, H2, O2, N2, NO, NH3, CO, and CO2, based on 100 ppm total inlet impurities. Other impurities removed include CF4, CCl4, SiH4, and hydrocarbons such as CH4Outlet impurities less than 10 ppb H2O, H2, O2, NO, NH3, CO, and CO2, based on 100 ppm total inlet impurities. Other impurities removed include CF4, CCl4, SiH4, and hydrocarbons other than CH4
Additional Prep Fees May Apply
